The Terefilm Photopolymer is a groundbreaking material designed to tackle key challenges in semiconductor manufacturing, such as precision mass transfer and high-resolution photolithography. This innovative material balances precise patternability with clean decomposition, making it ideal for applications that demand high accuracy and stringent cleanliness standards in production.
Terefilm offers exceptional thermal stability, remaining intact at temperatures up to 180°C before UV exposure. Once exposed to low-energy UV irradiation, the decomposition temperature drops significantly, facilitating a low-energy vaporization process. This unique feature allows Terefilm to integrate seamlessly into high-temperature process flows, making it incredibly versatile in manufacturing settings.
One of the key advantages of Terefilm is its ability to decompose completely into gaseous products, leaving no residue. This results in a cleaner and more efficient manufacturing process, eliminating the need for subsequent cleaning steps commonly associated with other solutions. Terefilm's precise patterning capabilities allow for controlled decomposition, ensuring uniform activation and vaporization over targeted areas, which is essential for reliable and repeatable semiconductor manufacturing processes.
